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Vacuum Plasma System
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LWS-VPC-1000K
Vacuum Plasma System
제품 용도
A device that can etch/clean the surface of the substrate and lead frame for EMC with plasma of Ar, O2
제품 특징
제품 사양
LWS-VPC-1000K
- RF Generator : 1000W
Matcher : Digital Matcher / AVC(Auto Matching)
Feed through
Accessory
Accessory
- MFC : 5CH(Ar, O2, N2, H2, Air)
Piping & Fitting
- Auto Pressurer Control
- Controller : PLC & Touch / Wiring & I/O check / Electric Part
- Pump Type : Dry
- Sensor &Gauge : Bartron / ATM
- Material : SUS-304 / A6061
- Door : Process Viw Port
